Because HTRB tests stress the die, they can lead to junction leakage. There can also be parametric changes resulting from the release of ionic impurities onto the die surface, from either the package or the die itself. This test’s high temperature accelerates failure mechanisms according to Arrhenius equation, which states the temperature dependence of reaction rates. Therefore, this simulates a test conducted for a much longer period at a lower temperature. The leakage current is continuously monitored throughout the HTRB test and a fairly constant leakage current is generally required to pass it. Because it combines electrical and thermal stress, this test can be used to check the junction integrity, crystal defects and ionic-contamination level, which can reveal weaknesses or degradation effects in the field depletion structures at the device edges and in the passivation.